SUBSTRATE CLEANING METHOD
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United States of America Patent
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Jul 20, 2017
app pub date -
Jan 15, 2016
filing date -
Jan 15, 2016
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Abstract
A substrate cleaning method is provided. A substrate is provided, followed by performing a first pre-cleaning process with a first rotation speed and a first duration time. After the first pre-cleaning process, a second pre-cleaning process is performed with a second rotation speed and a second duration time, wherein the second rotation speed is greater than the first rotation speed. After the second pre-cleaning process, a cleaning process is performed by using a chemical agent with a cleaning rotation speed.
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