Importance

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Abstract

An exposure apparatus includes a light source, an illumination optical system, a mask, and a projection optical system. The mask is configured from a plurality of small masks individually formed from small patterns in a plurality of regions into which a pattern to configure one device is divided. The projection optical system is configured in a size corresponding to a size of the small masks and projecting the small patterns in a reduced scale on a substrate. The necessity for a projection optical system for which accuracy against aberration is demanded and a high-price lens is used is eliminated, and it is possible to use a projection optical system configured from a small-sized lens having a small projection area and less liable to be influenced by aberration. Consequently, the exposure apparatus can be provided at a reduced cost.

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First Claim