SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME

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United States of America Patent

APP PUB NO 20170213842A1
SERIAL NO

15067855

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Abstract

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A semiconductor memory device includes a substrate, a stack disposed on the substrate, a vertical channel structure penetrating the stack, and a fixed charge layer disposed in the vertical channel structure. The stack includes insulating patterns and gate electrodes alternately and repeatedly disposed on one another. The vertical channel structure includes a data storing pattern.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTD129 SAMSUNG-RO YEONGTONG-GU SUWON-SI GYEONGGI-DO 16677

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHO, Eunsuk Suwon-si, KR 9 36
CHO, Hyejin Hwaseong-si, KR 15 608
JEONG, Jaehoon Hwaseong-si, KR 52 113
KIM, Bio Seoul, KR 24 298
KIM, Young-Gu Osan-si, KR 47 333
PARK, Min-chul Hwaseong-si, KR 16 33
YUN, Jong In Seoul, KR 2 10

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