Method of manufacturing piezoelectric device

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United States of America Patent

PATENT NO 10272685
APP PUB NO 20170217182A1
SERIAL NO

15418882

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Abstract

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A method is provided for manufacturing a piezoelectric device including a piezoelectric element that is disposed above a diaphragm and that has a multilayer structure including a first electrode disposed above the diaphragm, a piezoelectric layer disposed on the first electrode, and a second electrode disposed on the piezoelectric layer. The method includes forming the multilayer structure including the first electrode, the piezoelectric layer, and the second electrode above the diaphragm, forming a voltage application electrode extending outwardly from an end of the second electrode to cover a region located above the piezoelectric layer in an inactive section having no second electrode, applying a voltage between the first electrode and the second electrode, and removing the voltage application electrode.

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Patent Owner(s)

  • SEIKO EPSON CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukuda, Shunya Azumino, JP 61 78
Fukuzawa, Yuma Matsumoto, JP 65 154
Ota, Mutsuhiko Matsumoto, JP 25 134
Shimada, Masato Chino, JP 76 1100

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