Chamber for patterning non-volatile metals

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United States of America Patent

PATENT NO 9953843
SERIAL NO

15017444

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Abstract

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Apparatuses suitable for etching substrates at various pressure regimes are described herein. Apparatuses include a process chamber including a movable pedestal capable of being positioned at a raised position or a lowered position, showerhead, and optional plasma generator. Apparatuses may be suitable for etching non-volatile metals using a treatment while the movable pedestal is in the lowered position and a high pressure exposure to organic vapor while the movable pedestal is in the raised position.

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Patent Owner(s)

  • LAM RESEARCH CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Shuogang San Jose, US 13 34
Lill, Thorsten Santa Clara, US 99 3366
Panagopoulos, Theo San Jose, US 9 269
Shen, Meihua Fremont, US 69 2336

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