Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10699878
APP PUB NO 20170236688A1
SERIAL NO

15428585

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Abstract

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A chamber member of a plasma source is provided and includes a sidewall, a transition member, a top wall and an injector connecting member. The sidewall is cylindrically-shaped and surrounds an upper region of a substrate processing chamber. The transition member is connected to the sidewall. The top wall is connected to the transition member. The injector connecting member is connected to the top wall, positioned vertically higher than the sidewall, and configured to connect to a gas injector. Gas passes through the injector connecting member via the gas injector and into the upper region of the substrate processing chamber. A center height to low inner diameter ratio of the chamber member is 0.25-0.5 and/or a center height to outer height ratio of the chamber member is 0.4-0.85.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Angelov, Ivelin San Jose, US 18 939
Caron, James Eugene Tracy, US 5 264
Lai, Canfeng Fremont, US 52 3110
Park, Joon Hong Dublin, US 26 549
Treadwell, Jason Lee Gilroy, US 4 98

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