Charged particle beam drawing apparatus and charged particle beam drawing method
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United States of America Patent
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Dec 26, 2017
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N/A
app pub date -
Feb 8, 2017
filing date -
Feb 23, 2016
priority date (Note) -
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status (Latency Note)
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Abstract
In one embodiment, A charged particle beam drawing apparatus includes an irradiation amount resetting processing circuitry changing the irradiation amount in the shot data to the irradiation amount lower limit value when the irradiation amount defined in the shot data is less than the irradiation amount lower limit value, a shot size adjustment processing circuitry changing the shot size defined in the shot data, based on an amount of the change in the irradiation amount, a shot position adjustment processing circuitry changing the shot position defined in the shot data, based on an amount of the change in the shot size, and a drawing device drawing a pattern by irradiating the substrate with the charged particle beam, using the shot data in which the irradiation amount, the shot size, and the shot position have been changed.
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