Cleaning method and laminate of aluminum nitride single-crystal substrate

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United States of America Patent

PATENT NO 10753011
APP PUB NO 20170260650A1
SERIAL NO

15508501

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Abstract

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A method for effectively removing minute impurities of 1 μm or less in size that are present on a surface of an aluminum nitride single-crystal substrate without etching the surface includes scrubbing a surface of an aluminum nitride single-crystal substrate using a polymer compound material having lower hardness than an aluminum nitride single crystal, and an alkali aqueous solution having 0.01-1 mass % concentration of potassium hydroxide or sodium hydroxide, the alkali aqueous solution being absorbed in the polymer compound material.

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Patent Owner(s)

Patent OwnerAddress
TOKUYAMA CORPORATIONSHUNAN-SHI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ariyuki, Masao Yamaguchi, JP 8 15

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