ARRANGEMENT FOR PROCESSING SUBSTRATE AND SUBSTRATE CARRIER
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United States of America Patent
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Jun 5, 2017
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May 26, 2009
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Abstract
The invention relates to an arrangement for processing a substrate in a reaction chamber of a gas deposition apparatus by exposing the substrate to alternate, saturated surface reactions of starting materials, the arrangement comprising loading means for loading the substrate into the reaction chamber on a substrate support. In accordance with the invention, the substrate is arranged for being attached in a detachable manner with an adhesive to the substrate carrier.
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