Molten target sputtering (MTS) deposition for enhanced kinetic energy and flux of ionized atoms

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United States of America Patent

PATENT NO 10947639
APP PUB NO 20170268122A1
SERIAL NO

15463778

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Various embodiments provide Molten Target Sputtering (MTS) methods and devices. The various embodiments may provide increases in the kinetic energy, increases in the energy latency, and/or increases in the flux density of molecules for better crystal formation at low temperature operation. The various embodiment MTS methods and devices may enable the growth of a single crystal Si1-xGex film on a substrate heated to less than about 500° C. The various embodiment MTS methods and devices may provide increases in the kinetic energy, increases in the energy latency, and/or increases in the flux density of molecules without requiring the addition of extra systems.

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  • THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF NASA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Sang H Poquoson, US 42 179
Kim, Hyun Jung Poquoson, US 141 980

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