Debris-removal groove for CMP polishing pad

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10875146
APP PUB NO 20170274496A1
SERIAL NO

15079824

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The invention provides a polishing pad suitable for polishing or planarizing at least one of semiconductor, optical and magnetic substrates. The polishing pad includes a polishing layer having a polymeric matrix, a thickness and a polishing track representing a working region of the polishing layer for polishing or planarizing. Radial drainage grooves extend through the polishing track facilitate polishing debris removal through the polishing track and underneath the at least one of semiconductor, optical and magnetic substrates and then beyond the polishing track toward the perimeter of the polishing pad during rotation of the polishing pad.

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Patent Owner(s)

  • ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Connell, Patricia Rising Sun, US 1 4
Cook, Lee Melbourne Atglen, US 58 1818
Hendron, Jeffrey James Elkton, US 21 61
So, Joseph Wilmington, US 7 6
Tong, Yuhua Hockessin, US 150 621

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