POLISHING COMPOSITION, METHOD FOR MANUFACTURING SAME, AND POLISHING METHOD
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United States of America Patent
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Jul 27, 2015
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Sep 30, 2014
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Abstract
There is provided a polishing composition capable of polishing a polishing object including elemental silicon, a silicon compound, metals and the like, especially including tungsten, at a high polishing rate. The polishing composition includes: colloidal silica with organic acid immobilized to a surface thereof; hydrogen peroxide; and salt, the salt being at least one of ammonium nitrate and ammonium sulfate.
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