SPAN MASK GENERATION
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United States of America Patent
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Apr 7, 2016
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Apr 7, 2016
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Abstract
Examples of the present disclosure provide apparatuses and methods for span mask generation. An example method comprises creating, using sensing circuitry, a number of bit vectors, wherein each of the number of bit vectors includes a repeating pattern based on a size of the number of bit vectors and a particular mask depth.
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