Method for treating graphene sheets for large-scale transfer using free-float method

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United States of America Patent

PATENT NO 10017852
SERIAL NO

15099464

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Abstract

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A method for transferring a graphene sheet from a copper substrate to a functional substrate includes forming the graphene sheet on the copper substrate using chemical vapor deposition, and irradiating the graphene sheet disposed on the copper substrate with a plurality of xenon ions using broad beam irradiation to form a prepared graphene sheet. The prepared graphene sheet is resistant to forming unintentional defects induced during transfer of the prepared graphene sheet to the functional substrate. The method further includes removing the copper substrate from the prepared graphene sheet using an etchant bath, floating the prepared graphene sheet in a floating bath, submerging the functional substrate in the floating bath, and decreasing a fluid level of the floating bath to lower the prepared graphene sheet onto the functional substrate.

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Patent Owner(s)

Patent OwnerAddress
LOCKHEED MARTIN CORPORATION6801 ROCKLEDGE DRIVE BETHESDA MD 20817

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bedworth, Peter V Los Gatos, US 41 1187
Heise, Scott E San Jose, US 13 320
Sinton, Steven W Palo Alto, US 20 557
Swett, Jacob L Redwood City, US 16 356

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