PHOTOCURABLE RESIN COMPOSITION, INK AND COATING MATERIAL

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United States of America Patent

SERIAL NO

15517850

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Abstract

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Provided is a photocurable resin composition containing an allylic polymer (A) which has excellent adhesion to plastic substrates. The present invention relates to a photocurable resin composition containing an allylic polymer (A), the allylic polymer (A) being produced by polymerization of an allylic compound represented by the following formula (I):

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Patent Owner(s)

Patent OwnerAddress
OSAKA SODA CO LTDJAPAN OSAKA OSAKA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
INOUE, Satoshi Osaka, JP 511 10547
OHASHI, Shinichiro Osaka, JP 22 440
YOKOYAMA, Katsutoshi Osaka, JP 9 26

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