DEVICES AND METHODS OF FABRICATION OF SINUSOIDAL PATTERNED SILICON DIOXIDE SUBSTRATES
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May 18, 2017
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Nov 22, 2014
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A method for fabricating nanoscale patterned oxide substrates and devices incorporating the substrates are provided. Highly periodic or non-periodic sinusoidal patterns and other fine oxide patterns are formed on the surface of a suitable base such as silicon. Fine oxide surface patterns are created with photolithography, etching and three different oxide formation events. Thin layers of conductor materials including graphene and metals can be applied to the oxide surface patterns of the substrate and conform to the pattern allowing morphology and physical properties the conductor layer to be tuned. Control over device characteristics is demonstrated by varying the dimensions, strain, orientation, wavelength and amplitude of graphene sheet corrugations. A patch antenna device with a periodic sinusoidal graphene sheet on a silicon oxide substrate mounted to a ground plane was demonstrated.
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