METHODS AND APPARATUS FOR UNIFORMLY METALLIZATION ON SUBSTRATES

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United States of America Patent

SERIAL NO

15585673

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Abstract

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An apparatus for substrate metallization from electrolyte is provided. The apparatus comprises: an immersion cell containing metal salt electrolyte; at least one electrode connecting to at least one power supply; an substrate holder holding at least one substrate to expose a conductive side of the substrate to face the at least one electrode, the substrate holder being electricity conducting; an oscillating actuator oscillating the substrate holder with an amplitude and a frequency; at least one ultrasonic device with an operating frequency and an intensity, disposed in the metallization apparatus; at least one ultrasonic power generator connecting to the ultrasonic device; at least one inlet for metal salt electrolyte feed; and at least one outlet for metal salt electrolyte drain.

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Patent Owner(s)

Patent OwnerAddress
ACM RESEARCH (SHANGHAI) INCBUILDING 4 NO 1690 CAI LUN ROAD CHINA (SHANGHAI) PILOT FREE TRADE ZONE PUDONG NEW AREA SHANGHAI 201203 201203

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
He, Chuan Shanghai, CN 143 1886
Ma, Yue Shanghai, CN 269 3729
Wang, Hui Shanghai, CN 1115 8921
Wang, Xi Shanghai, CN 356 3114

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