Sulfonium compound, making method, resist composition, and pattern forming process

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United States of America Patent

PATENT NO 10248022
APP PUB NO 20170329227A1
SERIAL NO

15590422

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Abstract

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A sulfonium compound having formula (1) exerts a satisfactory acid diffusion control function wherein R1, R2 and R3 are a C1-C20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved resolution, LWR, MEF and CDU.

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Patent Owner(s)

  • SHIN-ETSU CHEMICAL CO. LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ohashi, Masaki Joetsu, JP 183 1851
Taniguchi, Ryosuke Joetsu, JP 44 379

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