SUBSTRATE LIQUID TREATMENT APPARATUS, TANK CLEANING METHOD AND NON-TRANSITORY STORAGE MEDIUM
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United States of America Patent
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Issued Date -
Nov 23, 2017
app pub date -
May 17, 2017
filing date -
May 17, 2016
priority date (Note) -
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Abstract
In one embodiment, a substrate liquid treatment apparatus includes: a tank that stores a processing liquid; a circulation line connected to the tank, through which circulation line a circulation flow of the processing liquid that leaves the tank and then returns back to the tank; a processing unit that processes a substrate by supplying the processing liquid, distributed from the circulation line, to the substrate; a return line that returns, to the tank, the processing liquid discharged from the processing unit after being supplied to the substrate; a cleaning nozzle that discharges a cleaning liquid onto an inner wall surface of the tank to clean the inner wall surface by the cleaning liquid; and a cleaning line that supplies the cleaning liquid to the cleaning nozzle.
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