Ion implantation process and ion implanted glass substrates

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United States of America Patent

PATENT NO 10703674
APP PUB NO 20170334775A1
SERIAL NO

15520908

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Abstract

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The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 1014 ions/cm2 and 2.5×1017 ions/cm2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.

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Patent Owner(s)

  • AGC GLASS EUROPE; AGC INC.; QUERTECH INGENIERIE

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Boulanger, Pierre Couthuin, BE 90 1922
Busardo, Denis Gonneville sur Mer, FR 29 57
Guernalec, Frederic Liffre, FR 9 19
Navet, Benjamine Louvain-la-Neuve, BE 12 17
Ventelon, Lionel Nivelles, BE 15 40

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