Systems and methods for automatic correction of drift between inspection and design for massive pattern searching

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United States of America Patent

PATENT NO 11010886
APP PUB NO 20170337673A1
SERIAL NO

15594300

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Abstract

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Systems and methods for automatic correction of drift between inspection and design for massive pattern searching are disclosed herein. Defects are identified in a scan of a wafer. The defects are associated with tool coordinates. An SEM review tool captures centered images of the defects. The SEM review tool is aligned with the wafer using design polygons in an imported design file. Design coordinates are exported and used to define patterns of interest and identifying locations of those patterns of interest.

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Patent Owner(s)

  • KLA-TENCOR CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsueh, Ming-Hsiang Zhubei, TW 15 286
Tseng, Chi-Yuan Hsinchu, TW 2 15

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