POLISHING COMPOSITION
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United States of America Patent
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Jan 19, 2016
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Jan 19, 2015
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To provide a technique with which in a case where sulfonic acid-modified aqueous anionic sol is used as abrasive grain, in a polishing composition for polishing an object to be polished that contains SiN, the stability of the SiN polishing rate with time can be improved, and the content of hydrogen peroxide can be decreased.
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