Surface treatment method for SiC substrate

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United States of America Patent

PATENT NO 10665465
APP PUB NO 20170345672A1
SERIAL NO

15527526

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Abstract

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Provided is a surface treatment method for a SiC substrate (40), the method being capable of controlling whether to generate a step bunching or the type of step bunching that is generated. In the surface treatment method in which the surface of the SiC substrate (40) is etched by heating the SiC substrate (40) under Si vapor pressure, an etching mode and an etching depth which are determined at least on the basis of an etching rate, are controlled to etch the SiC substrate (40), so that a surface pattern of the SiC substrate (40) after etching treatment is controlled.

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Patent Owner(s)

  • KWANSEI GAKUIN EDUCATIONAL FOUNDATION; TOYO TANSO CO. LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ashida, Koji Sanda, JP 21 38
Kaneko, Tadaaki Sanda, JP 58 86
Kutsuma, Yasunori Sanda, JP 17 5
Nogami, Satoru Kanonji, JP 43 282
Shinohara, Masato Kanonji, JP 9 10
Teramoto, Youji Kanonji, JP 6 12
Torimi, Satoshi Kanonji, JP 19 33
Yabuki, Norihito Kanonji, JP 16 23

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