Process for filling etched holes using photoimageable thermoplastic polymer

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United States of America Patent

PATENT NO 10329146
APP PUB NO 20170349431A1
SERIAL NO

15623267

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A process for filling one or more etched holes defined in a frontside surface of a wafer substrate. The process includes the steps of: (i) depositing a layer of a photoimageable thermoplastic polymer onto the frontside surface and into each hole; (ii) reflowing the polymer; (iii) selectively removing the polymer from regions outside a periphery of each hole, the selective removing comprising exposure and development of the polymer; (iv) optionally repeating steps (i) to (iii) until each hole is overfilled with the polymer; and (v) planarizing the frontside surface to provide one or more holes filled with a plug of the polymer. Each plug has a respective upper surface coplanar with the frontside surface.

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Patent Owner(s)

  • MEMJET TECHNOLOGY LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
McAvoy, Gregory Dublin, IE 5 2
North, Angus Sydney, AU 18 13
O'Reilly, Ronan Dublin, IE 5 1

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