Inductively Coupled Plasma Source with Multiple Dielectric Windows and Window Supporting Structure
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United States of America Patent
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Aug 24, 2017
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Jul 20, 2012
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Abstract
A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.
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