DEPOSITION APPARATUS AND DEPOSITION METHOD

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United States of America Patent

APP PUB NO 20170361404A1
SERIAL NO

15253901

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A deposition apparatus and a deposition method are described. The deposition apparatus includes an accommodating element, a plurality of lasers and a carrier. The accommodating element is configured to accommodate a material. The lasers are disposed at a periphery of the accommodating element, and are configured to simultaneously emit a plurality of laser beams toward the material to melt the material to form a deposition liquid. The carrier is disposed under the accommodating element and the lasers, and are configured to carry the deposition liquid.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL CHENG KUNG UNIVERSITYNO 1 UNIVERSITY ROAD TAINAN CITY 701

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HUANG, Chi-Chuan TAINAN CITY, TW 11 98
LIN, Tzu-Hsiang TAINAN CITY, TW 14 22
YANG, Chane-Yuan TAIPEI CITY, TW 1 3

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