Modified colloidal silica and method for producing the same, and polishing agent using the same

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United States of America Patent

PATENT NO 11499070
APP PUB NO 20170362465A1
SERIAL NO

15544389

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Abstract

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To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.

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Patent Owner(s)

  • FUJIMI INCORPORATED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ashitaka, Keiji Kiyosu, JP 43 27
Tsubota, Shogo Kiyosu, JP 16 23

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