Design/technology co-optimization platform for high-mobility channels CMOS technology

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United States of America Patent

PATENT NO 9953125
SERIAL NO

15183333

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Abstract

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Embodiments of the present invention may provide the capability to design SRAM cells may be designed that is compatible with the requirements of InGaAs integration by selective epitaxy in SiO2 cavities without sacrificing density and area scaling. In an embodiment of the present invention, a computer-implemented method for designing a hybrid integrated circuit may comprise receiving data representing a layout of a static random-access memory cell array, identifying areas between active channel regions that do not overlap with transistor gates of static random-access memory cells of the static random-access memory cell array, selecting from among the identified areas at least one area, expanding the selected areas to determine whether the expanded area intersects with a p-doped active Si semiconductor or p-channel semiconductor area, and marking as Si seed locations the identified expanded areas that do not intersect on both sides with a channel active transistor region.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINE CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Caimi, Daniele Besenbueren, CH 14 76
Czornomaz, Lukas Zurich, CH 60 406
Deshpande, Veeresh V Zurich, CH 19 68
Djara, Vladimir Kilchberg, CH 16 60
Fompeyrine, Jean Waedenswil, CH 53 428

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