POLYAMIC ACID, POLYIMIDE, POLYIMIDE FILM AND COPPER CLAD LAMINATE USING THE SAME

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United States of America Patent

SERIAL NO

15497322

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Abstract

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A polyamic acid as a polymer of a dianhydride monomer and a diamine monomer is disclosed. The dianhydride monomer is an aromatic tetrabasic carboxylic acid dianhydride monomer. The diamine monomer comprises a diamine monomer containing pyrimidinyl and an aromatic diamine monomer. A polyimide, a polyimide film and a copper clad laminate using the polyamic acid are also provided.

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Patent Owner(s)

Patent OwnerAddress
ZHEN DING TECHNOLOGY CO LTDNO 6 LANE 28 SAN HO RD SAN SHI VILLAGE TAYUAN TAOYUAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HSIANG, SHOU-JUI Taoyuan, TW 30 27
HSU, MAO-FENG Taoyuan, TW 28 57
KAO, YU-WEN Taoyuan, TW 5 1
SU, SZU-HSIANG Taoyuan, TW 20 2
TENG, CHIA-YIN Taoyuan, TW 4 1

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