Plasmonic device, method of manufacturing a plasmonic device and method of analysis using a plasmonic device
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United States of America Patent
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Sep 8, 2020
Grant Date -
Dec 28, 2017
app pub date -
Jun 22, 2017
filing date -
Jun 23, 2016
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Abstract
A plasmonic device is disclosed, the plasmonic device having a base substrate and an electrically conductive film formed on the base substrate. The base substrate has a reference upper surface and an arrangement of chiral nanostructures formed in relief from the reference upper surface. Each chiral nanostructure has a nanostructure upper surface which is disposed at a distance of at least 30 nm from the reference upper surface in a thickness direction. The electrically conductive film is formed on the nanostructure upper surface of each chiral nanostructure and on at least part of the reference upper surface of the base substrate. Also disclosed is a method of analysis of a biological material using the plasmonic device, by depositing the biological material onto the plasmonic device and irradiating the plasmonic device and the biological material with electromagnetic radiation. The arrangement of chiral nanostructures and electrically conductive film generates a superchiral electromagnetic field, the effect of the presence of the biological material on the superchiral electromagnetic field then being detected.
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