Method and recording medium of reducing chemoepitaxy directed self-assembled defects
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United States of America Patent
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Oct 30, 2018
Grant Date -
Dec 28, 2017
app pub date -
Sep 7, 2017
filing date -
May 27, 2016
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Abstract
A method, system, and non-transitory computer readable medium for reducing chemo-epitaxy directed-self assembly (DSA) defects of a layout of a guiding pattern include inserting an internal dummy between a first portion of the guiding pattern and a second portion of the guiding pattern if a vertical spacing is equal to or greater than a first predetermined distance, inserting a first external dummy along an external edge of the guiding pattern in a vertical direction if the vertical spacing is greater than a second predetermined distance, and inserting an anti-taper structure on the first external dummy if a second distance from the external edge of the guiding pattern to an edge of the first external dummy is greater than a first distance.
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