SUBSTRATE TREATING UNIT, BAKING APPARATUS INCLUDING THE SAME, AND SUBSTRATE TREATING METHOD USING BAKING APPARATUS
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United States of America Patent
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Issued Date -
Dec 28, 2017
app pub date -
Jun 20, 2017
filing date -
Jun 24, 2016
priority date (Note) -
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status (Latency Note)
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Abstract
Disclosed is a heating unit that heats a substrate. The heating unit includes a housing providing a treatment space in the interior thereof, a heating plate supporting a substrate in the treatment space, a heating member provided in the heating plate and configured to heat-treat the substrate supported by the heating plate, an exhaust member configured to exhaust gas in an interior space of the housing, and an exterior gas supply part installed in the housing and configured to supply exterior gas into the treatment space, wherein the exterior gas supply part includes a plurality of inlets provided in the housing, and a plurality of flow rate adjusting members installed in the inlets, respectively, and configured to adjust flow rates of the exterior gas introduced into the inlets.
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