Magnetic material sputtering target and manufacturing method thereof

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United States of America Patent

PATENT NO 10325761
APP PUB NO 20180005807A1
SERIAL NO

15702777

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is an oxide-containing magnetic material sputtering target wherein the oxides have an average grain diameter of 400 nm or less. Also provided is a method of producing an oxide-containing magnetic material sputtering target. The method involves depositing a magnetic material on a substrate by the PVD or CVD method, then removing the substrate from the deposited magnetic material, pulverizing the material to obtain a raw material for the target, and further sintering the raw material. An object is to provide a magnetic material target, in particular, a nonmagnetic grain-dispersed ferromagnetic sputtering target capable of suppressing discharge abnormalities of oxides that are the cause of particle generation during sputtering.

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Patent Owner(s)

  • JX NIPPON MINING & METALS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nakamura, Yuichiro Ibaraki, JP 105 593
Ogino, Shin-ichi Ibaraki, JP 24 169

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