SUBSTRATE TREATING APPARATUS
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United States of America Patent
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app pub date -
Jun 26, 2017
filing date -
Jun 30, 2016
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Abstract
Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a spin head, a support shaft connected to a lower portion of the spin head to support the spin head, a pin located on an upper surface of the spin head to support the substrate and having a space in the interior thereof, and a nozzle member configured to supply a liquid to the substrate located on the spin head.
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