ESC CERAMIC SIDEWALL MODIFICATION FOR PARTICLE AND METALS PERFORMANCE ENHANCEMENTS
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United States of America Patent
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May 12, 2017
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Jul 1, 2016
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Abstract
A substrate support for a substrate processing system includes a baseplate and a ceramic layer arranged on the baseplate. The ceramic layer includes a lower surface, an upper surface configured to support a substrate, and sidewalls around a perimeter of the ceramic layer extending from the lower surface to the upper surface, and the ceramic layer comprises a first material. A bond layer is provided between the baseplate and the ceramic layer. A protective layer is formed on the sidewalls of the ceramic layer. The protective later comprises a second material different from the first material.
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