Collar, conical showerheads and/or top plates for reducing recirculation in a substrate processing system
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United States of America Patent
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Sep 3, 2019
Grant Date -
Jan 11, 2018
app pub date -
Jul 11, 2016
filing date -
Jul 11, 2016
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate processing system includes a processing chamber and a showerhead including a faceplate, a stem portion and a cylindrical base portion. A collar connects the showerhead to a top surface of the processing chamber. The collar defines a gas channel to receive secondary purge gas and a plurality of gas slits to direct the secondary purge gas from the gas channel in a radially outward and downward direction. A conical surface is arranged adjacent to the cylindrical base and around the stem portion of the showerhead. An inverted conical surface is arranged adjacent to a top surface and sidewalls of the processing chamber. The conical surface and the inverted conical surface define an angled gas channel from the plurality of gas slits to a gap defined between a radially outer portion of the cylindrical base portion and the sidewalls of the processing chamber.
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