Mn—Zn—O sputtering target and production method therefor

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United States of America Patent

PATENT NO 10811237
APP PUB NO 20180019109A1
SERIAL NO

15546666

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Abstract

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Provided is a Mn—Zn—O sputtering target which can be used in DC sputtering, and a production method for the target. The Mn—Zn—O sputtering target comprises a chemical composition containing Mn, Zn, O, and at least one element X, the element X being a single one or two elements selected from the group consisting of W and Mo. The target has a relative density of 90% or more and a specific resistance of 1×10−3 Ω·cm or less.

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Patent Owner(s)

  • DEXERIALS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kamori, Yuichi Tome, JP 9 15
Sugawara, Junichi Tome, JP 33 146

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