Block copolymer pattern formation method and diffraction limited optical element
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United States of America Patent
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Feb 2, 2021
Grant Date -
Feb 1, 2018
app pub date -
Jul 27, 2017
filing date -
Jul 29, 2016
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Abstract
Provided are a block copolymer pattern formation method that enables formation, over a large area, of a block copolymer pattern with a perpendicularly oriented lamellar structure enabling nanoscale surface shape control, and a diffraction limited optical element produced using the block copolymer pattern formation method. The block copolymer pattern formation method is a method for forming a block copolymer pattern on a substrate and includes forming an oblique angle vapor deposited film on the substrate, applying a block copolymer onto the oblique angle vapor deposited film that has been formed, and subjecting the block copolymer that has been applied to perpendicularly oriented lamellar structure development post-treatment to form a pattern with a perpendicularly oriented lamellar structure.
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