GAS ANALYSIS DEVICE, CONTROL SYSTEM AND CONTROL ASSISTANCE SYSTEM FOR COMBUSTION FACILITY, AND GAS ANALYSIS METHOD

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United States of America Patent

SERIAL NO

15552670

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Abstract

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A gas analysis device includes: a measurement part configured to measure an absorption amount of a laser light including an absorption wavelength corresponding to at least two electronic level transitions having the same component contained in the combustion gas, by emitting the laser light on a plurality of measurement paths disposed to pass through the combustion gas; a standard setting part configured to set a standard gas concentration distribution and a standard temperature distribution on the basis of a measurement result of the measurement part; and an analysis part configured to obtain the gas concentration distribution and the temperature distribution by solving a function including the gas concentration distribution and the temperature distribution as variables so as to minimize a difference between the absorption amount measured by the measurement part and a standard absorption amount obtained on the basis of the standard gas concentration distribution and the standard temperature distribution.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI HEAVY INDUSTRIES LTD2-3 MARUNOUCHI 3-CHOME CHIYODA-KU TOKYO 100-8332

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KAWAZOE, Kohei Tokyo, JP 22 130
NISHIMIYA, Tatsuyuki Tokyo, JP 12 38
OKA, Hirotaka Tokyo, JP 6 2

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