Semiconductor devices and methods of manufacturing the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10062609
APP PUB NO 20180033691A1
SERIAL NO

15393506

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Abstract

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A semiconductor device includes a first insulating interlayer on a substrate, metal lines in the first insulating interlayer, a first air gap between the metal lines in a first region of the substrate and a second air gap between the first insulating interlayer and at least one of the metal lines in a second region of the substrate, a liner layer covering top surfaces and side walls of the metal lines and a top surface and a side wall of the first insulating interlayer, adjacent to the first and second air gaps, and a second insulating interlayer on the liner layer and contacting the liner layer.

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Patent Owner(s)

  • SAMSUNG ELECTRONICS CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baek, Jong Min Seoul, KR 35 78
Han, Kyu Hee Hwaseong-si, KR 11 360
Jang, Sang Shin Gwangyang-si, KR 11 12
Jung, Eun Ji Hwaseong-si, KR 9 44
Kim, Byung Hee Seoul, KR 39 315
Lee, Nae In Seoul, KR 33 464
Lee, Woo Jin Hwaseong-si, KR 147 5685
Nguyen, Vietha Yongin-si, KR 8 44
You, Woo Kyung Incheon, KR 16 37

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