Pellicle manufacturing method and method for manufacturing photomask with pellicle

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United States of America Patent

PATENT NO 10895805
APP PUB NO 20180046071A1
SERIAL NO

15794420

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Abstract

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A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.

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Patent Owner(s)

Patent OwnerAddress
TAZMO CO LTD5311 HAGA KITA-KU OKAYAMA-SHI OKAYAMA 7011221 ?7011221

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Biyajima, Tsuneaki Otake, JP 8 49
Hirota, Toshiaki Ibara, JP 27 531
Ishikawa, Hisako Ichihara, JP 13 36
Kohmura, Kazuo Chiba, JP 45 216
Ono, Yosuke Sodegaura, JP 25 129
Sato, Yasuyuki Ibara, JP 53 598
Taneichi, Daiki Otake, JP 13 76

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