Inspection Apparatus, Inspection Method, Lithographic Apparatus, Patterning Device and Manufacturing Method
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United States of America Patent
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Oct 24, 2017
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Jun 12, 2015
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Abstract
Disclosed is a patterning device configured to pattern a beam of radiation according to a desired pattern during a lithographic process. The patterning device comprises first features configured to form a first target on a substrate during the lithographic process and second features configured to form a second target on the substrate during the lithographic process. The second features are taller, in a direction transverse to the plane of the first and second targets, than the first features, such that the first and second targets have a relative best focus offset.
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