FABRICATION OF ENHANCED SUPERCAPACITORS USING ATOMIC LAYER DEPOSITION OF METAL OXIDE ON NANOSTRUCTURES
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United States of America Patent
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Oct 6, 2017
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Jan 23, 2014
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A method to a fabricate high surface area, high performance supercapacitor includes include applying a metal layer to at least a portion of a nanostructure; after applying the metal layer, oxidizing the metal layer; applying a plurality of additional metal layers onto a previously oxidized metal layer; and after applying each additional metal layer, oxidizing the additional metal layer prior to applying a successive additional metal layer. The metal layers may include a composition comprising at least one metal, the at least one metal selected from the group consisting of ruthenium, titanium, manganese, vanadium, iron, tin, cobalt and nickel. Optionally, each of the additional metal layers may be applied using atomic layering deposition (ALD).
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