EXPOSURE METHOD, SUBSTRATE AND EXPOSURE APPARATUS

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United States of America Patent

SERIAL NO

15658372

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Abstract

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An exposure method, a substrate and an exposure apparatus are disclosed. In one embodiment, an exposure method includes: forming a mask combination from at least two masks; and exposing, by using the mask combination, a film layer to be exposed on a base substrate, until a complete exposed pattern is formed on the film layer to be exposed.

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Patent Owner(s)

Patent OwnerAddress
BOE TECHNOLOGY GROUP CO LTD100015 NO 10 JIUXIANQIAO ROAD BEIJING CHAOYANG DISTRICT BEIJING CITY BEIJING CITY 100015
BEIJING BOE DISPLAY TECHNOLOGY CO LTD100176 NO 118 JINGHAI 1ST ROAD DAXING ECONOMIC AND TECHNOLOGICAL DEVELOPMENT ZONE BEIJING BEIJING CITY BEIJING CITY 100176

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Li, Xiao Guang Beijing, CN 6 60
Wang, Dong Beijing, CN 600 4166
Xiao, Yu Beijing, CN 57 978
Xue, Chao Beijing, CN 57 195

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