Importance

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Abstract

To provide a polishing composition which is hard to cause etching or corrosion in a polishing target containing a transition metal having a standard electrode potential of -0.45 V or more and 0.33 V or less even when used for polishing the polishing target. The polishing composition contains abrasives and a metal protecting organic compound. The metal protecting organic compound has an interactive functional group which is a functional group interacting with a polishing target containing a transition metal having a standard electrode potential of −0.45 V or more and 0.33 V or less and an inhibiting functional group which is a functional group inhibiting the approach of the abrasives toward the polishing target.

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First Claim