Polishing composition

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United States of America Patent

PATENT NO 10781342
APP PUB NO 20180057711A1
SERIAL NO

15562692

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Abstract

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An object of the present invention is to provide a polishing composition which can sufficiently improve a polishing speed of an object to be polished having a silicon-oxygen bond such as a silicon oxide film or a polishing speed of an object to be polished having a silicon-nitrogen bond such as a silicon nitride film.

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Patent Owner(s)

  • FUJIMI INCORPORATED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Onishi, Shogo Kiyosu, JP 38 58
Sakabe, Koichi Kiyosu, JP 13 46
Sato, Takeki Kiyosu, JP 8 26
Yoshizaki, Yukinobu Kiyosu, JP 28 75

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