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Abstract

An optics component with double-layered micro-lens array includes mainly complex pinhole structures in array arrangement on one substrate face, and either substrate face has an optical micro-lens array. Both optical micro-lens arrays include a plurality of aspheric micro-lenses corresponding to the pinhole structures. When the component is in use, a UV light reflected by a DMD wafer is focused onto each pinhole structure through the plurality of aspheric micro-lenses in the optical micro-lens array of one face of a crystal substrate, and a small spot is formed, which may begin to diffuse after passing through the pinhole structure. Then, the beam is focused onto another face by the plurality of aspheric micro-lenses of another substrate face to obtain a small spot with a small circular spot approaching physical diffraction limit. The formed spot arrays can be applied to the scanning maskless and direct-write exposure lithography process.

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