Method for producing a metal-ceramic substrate with at least one via
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United States of America Patent
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Oct 6, 2020
Grant Date -
Mar 1, 2018
app pub date -
Aug 28, 2017
filing date -
Aug 29, 2016
priority date (Note) -
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Abstract
A method for producing a metal-ceramic substrate with at least one electrically conductive via, in which one metal layer, respectively, is attached in a planar manner to a ceramic plate or a ceramic layer to each of two opposing surface sides of the ceramic layer is provided. The method includes introducing a metal-containing, powdery and/or liquid substance into a hole in the ceramic layer delimiting the via prior to the attachment of both metal layers, or subsequent to the attachment of one of the two metal layers to form an assembly. Prior to the attachment of the other one of the two metal layers, and the assembly is subjected to a high-temperature step above 500° C. in which the metal-containing substance wets the ceramic layer at least partially with a wetting angle of less than 90°.
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