RADIO FREQUENCY PROCESSING APPARATUS AND METHOD

Number of patents in Portfolio can not be more than 2000

United States of America Patent

SERIAL NO

15673229

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

In an embodiment, an apparatus includes a radio frequency (RF) generator that is to generate a RF signal, first and second electrodes, and an impedance match module in series between the RF generator and the first electrode. The RF generator detects reflected power from the RF signal applied to a load electrically coupled between the first and second electrodes to change a temperature of the load, the RF signal to be applied to the load until the reflected power reaches a particular value.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
JOHN BEAN TECHNOLOGIES CORPORATION200 E RANDOLPH DRIVE CHICAGO IL 60601

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Brounley, Richard R Clearwater, US 1 0
Brounley, Richard W Palm Harbor, US 3 76
Timperio, Richard Catskill, US 6 2

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation