VORTICAL ATOMIZING NOZZLE ASSEMBLY, VAPORIZER, AND RELATED METHODS FOR SUBSTRATE PROCESSING SYSTEMS
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United States of America Patent
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May 22, 2017
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Sep 8, 2016
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Abstract
A vortical atomizing nozzle assembly, vaporizer, and related methods are disclosed for substrate processing systems. The vaporizer introduces an atomized or vaporized liquid into a substrate processing system and includes a vaporizer chamber, a nozzle assembly coupled to the inlet for the vaporizer chamber, and a carrier gas channel coupled to the nozzle assembly. The nozzle assembly includes a premix chamber, an outlet channel, and an expanding nozzle. The premix chamber includes a liquid inlet to receive the liquid to be vaporized and a gas inlet to receive the carrier gas. The carrier gas channel is positioned with respect to the gas inlet to cause a vortical flow within the premix chamber upon introduction of the carrier gas through the carrier gas channel. The premixed liquid from the premix chamber is received by the outlet channel and exits the outlet channel into the expanding nozzle.
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